发明名称 СПОСОБ И УСТРОЙСТВО ОТМЫВКИ И СУШКИ ПЛОСКИХ СТЕКЛЯННЫХ ПОДЛОЖЕК
摘要 FIELD: electronic engineering; group treatment of flat glass substrates. ^ SUBSTANCE: proposed method for washing and drying flat glass substrates includes following operations: substrate held in magazine is placed in washing bath filled with deionized water, washed out, and then slowly taken out of magazine; while substrates are being taken out of water, they are washed and dried out in nitrogen and organic solvent vapors; upon such treatment substrates are secured in extreme upper position, whereupon magazine is moved up, washed, and dried in the same way as substrates; treated substrates are placed in extreme upper position into magazine and the latter is then removed together with substrates from drying chamber. Device implementing proposed method is also given in invention specification. ^ EFFECT: enhanced quality of substrate treatment; ability of process automation in flexible production line; simplified design. ^ 2 cl 5 dwg
申请公布号 RU2005123878(A) 申请公布日期 2007.02.10
申请号 RU20050123878 申请日期 2005.07.27
申请人 Открытое акционерное общество "Научно-исследовательский институт полупроводникового машиностроени "(ОАО "НИИПМ") (RU);Общество с ограниченной ответственностью "Новые технологии и оборудование" (ООО "НТО") (RU);Российска  Федераци , от имени которой выступает Министерство обороны Российской Федерации (Управление развити  базовых военных технологий и строительных проектов) (RU) 发明人 Завалишин Александр Александрович (RU);Нагуманов Махь н Лукманович (RU);Быкова Людмила Юлиановна (RU)
分类号 H01L21/00 主分类号 H01L21/00
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