发明名称 |
Edge ring assembly with dielectric spacer ring |
摘要 |
An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.
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申请公布号 |
US2007032081(A1) |
申请公布日期 |
2007.02.08 |
申请号 |
US20050198296 |
申请日期 |
2005.08.08 |
申请人 |
CHANG JEREMY;FISCHER ANDREAS;KADKHODAYAN BABAK |
发明人 |
CHANG JEREMY;FISCHER ANDREAS;KADKHODAYAN BABAK |
分类号 |
H01L21/306;H01L21/302 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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