| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect inspection method and an appearance inspection device with stability enhanced of defect detection. <P>SOLUTION: A first threshold and a second threshold lower than that are used for inspection. In the event of dye comparison, difference images between an image of an inspection chip and images of left and right chips are threshold-determined by threshold processing parts 52a and 52b, respectively, by using the second threshold to find a defect candidate on the inspection chip. Further, the difference images between the image of the inspection chip and the images of the left and right chips are threshold-determined by threshold processing parts 51a and 51b, respectively, by using the first threshold to detect, as a defect, a difference image which is one between the image of the inspection chip and at least the difference image of either the left or right chip and which outputs a signal more than the first threshold, among difference images taken as defect candidates in the processing performed by using the above second threshold. Also in the event of cell comparison, difference images are first processed by the second threshold to find defect candidates, and further, the difference images are processed also by the first threshold to detect, as a defect, at least one difference image outputting a signal more than the first threshold out of two peaks, among difference images taken as defect candidates in the processing performed by using the above second threshold. <P>COPYRIGHT: (C)2007,JPO&INPIT |
