PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS AND PERMANENT PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming material adaptable to a plurality of laser light sources, ensuring less variation of performance due to a laser wavelength change, having high sensitivity, and capable of forming a high-definition pattern, and a pattern forming apparatus equipped with the pattern forming material and a permanent pattern forming method using the pattern forming material.

SOLUTION: The pattern forming material has at least a photosensitive layer formed of a photosensitive composition containing at least a binder, a polymerizable compound and a photopolymerization initiator, wherein when the photosensitive layer is exposed and developed, a sensitivity variation represented by the following formula 1 is ≤50%: sensitivity variation (%)=ä1-(Emin/Emax)}×100 in a wavelength range of 350-415 nm of minimum energy of light which is used in the exposure and does not change the thickness of the photosensitive layer in its part to be exposed after the exposure and development, wherein Eminrepresents a maximum value (mJ/cm2) of sensitivity; and Emaxrepresents a minimum value (mJ/cm2) of sensitivity.

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