| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a low-molecular weight compound usable for a resist composition, a polyphenol compound suitable as a raw material for the compound, a positive resist composition containing the compound, and a method for forming a resist pattern by using the positive resist composition. <P>SOLUTION: The polyphenol compound is represented, for example, by the formula of the figure. The positive resist compound contains the compound in a base material component. <P>COPYRIGHT: (C)2007,JPO&INPIT |
