| 摘要 |
A liquid immersion exposure apparatus includes a projection optical system (PL) which projects an image of a pattern onto a substrate (W) and a unit ( 5 ) which supplies a liquid ( 7 ) between an optical element ( 4 ) at the end of the projection optical system (PL) and the substrate (W). A corrosion-resistant film composed of an oxide is formed on the surface of the optical element (4) to prevent corrosion by the liquid ( 7 ). Consequently, a desired performance of the projection optical system can be secured for a long time even where a full field exposure in the step-and-repeat manner or a scanning exposure in the step-and-scan manner is performed in a liquid-immersion state.
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