发明名称 LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K INTERLEVEL DIELECTRIC LAYERS AND STRUCTURES
摘要 A composition of matter and a structure fabricated using the composition. The composition comprising; a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.
申请公布号 WO2007014882(A2) 申请公布日期 2007.02.08
申请号 WO2006EP64640 申请日期 2006.07.25
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;IBM UNITED KINGDOM LIMITED;HEDRICK, JAMES, LUPTON;MAGBITANG, TEDDIE, PEREGRINO;SANKARAPANDIAN, MUTHUMANICKAM;VOLKSEN, WILLI;KIM, HO-CHEOL;LEE, VICTOR, YEE-WAY;MILLER, ROBERT, DENNIS;SUNDBERG, LINDA, KARIN;DUBOIS, GERAUD, JEAN-MICHEL 发明人 HEDRICK, JAMES, LUPTON;MAGBITANG, TEDDIE, PEREGRINO;SANKARAPANDIAN, MUTHUMANICKAM;VOLKSEN, WILLI;KIM, HO-CHEOL;LEE, VICTOR, YEE-WAY;MILLER, ROBERT, DENNIS;SUNDBERG, LINDA, KARIN;DUBOIS, GERAUD, JEAN-MICHEL
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