发明名称 LIQUID LEVEL POSITION ADJUSTING MECHANISM AND LIQUID LEVEL POSITION ADJUSTING METHOD OF SINGLE CRYSTAL PULLING SYSTEM, AND LIQUID LEVEL POSITIONING MECHANISM AND LIQUID LEVEL POSITIONING METHOD OF SINGLE CRYSTAL PULLING SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an exact liquid level position-adjusting mechanism for pulling a single crystal from the surface of a melt in a Czochralski method. <P>SOLUTION: Image information are obtained by photographing positions and dimensions of mirror images 11B, 11C of a heat shielding body 11 or the distance between the real image 11A and the central position (distances of central points 12A, 12B and 12C) by using a camera arranged at the outside of a furnace while changing them by moving the level of the melt 2 upward and downward. Then, the changes of the positions and the dimensions or the distances between central positions are measured at a plurality of points from the image information, and the position of the level of the melt is adjusted by using, as a base, a standard point in the image information. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007031175(A) 申请公布日期 2007.02.08
申请号 JP20050213233 申请日期 2005.07.22
申请人 SUMCO CORP 发明人 TAKANASHI KEIICHI
分类号 C30B15/26 主分类号 C30B15/26
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