| 发明名称 |
Method and apparatus for processing semiconductor work pieces |
| 摘要 |
A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.
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| 申请公布号 |
US2007032097(A1) |
申请公布日期 |
2007.02.08 |
| 申请号 |
US20060441291 |
申请日期 |
2006.05.24 |
| 申请人 |
ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA |
发明人 |
CHEN AIHUA;TODAKA RYOJI;YIN GERALD |
| 分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
| 代理机构 |
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