POWER SUPPLYING DEVICE AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME

摘要

A power supply device and a plasma processing apparatus with the same are provided to connect simply a power supply head to a lower surface of an electrostatic chuck without an additional member by using an improved power supply head structure. A power supply device is used for applying a DC high voltage to an electrostatic chuck(118). The power supply device includes a body, a power supply head and a cable. The body(140) is formed like a pipe type structure with a cavity. The power supply head(160) is fixed to the body. The power supply head is capable of being elastically deformed. A portion of the power supply head is protruded from an upper portion of the body to contact the electrostatic chuck. The cable(150) is used for be electrically connected to the power supply head.