| 摘要 |
PROBLEM TO BE SOLVED: To provide an embossing apparatus capable of precisely effectively forming a finely rugged pattern. SOLUTION: The embossing apparatus 10 has a pattern roll 12 having a rugged pattern on the outer circumference, a support roll 14 arranged oppositely to the pattern roll 12, and a resin feeder 16 feeding a fine particle-like resin 5 on the pattern roll 12. The resin 5 fed from the resin feeder 16 enters the rugged portion of the pattern roll 12. The resin 5 is transferred to a base material 6 supplied between the pattern roll 12 and the support roll 14, and then the rugged pattern is formed on the base material 6. COPYRIGHT: (C)2007,JPO&INPIT |
