发明名称 ELECTRON SPIN UTILIZATION ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron spin utilization element for embodying a configuration to attain facility concerning an around nanometer-size ultra-thin film where the setting of a manufacture condition, etc., is very difficult only with an inorganic material and to prevent the generation of a pinhole. SOLUTION: The electron spin utilization element 10 comprises: an electron spin filter part 1 for selectively allowing an up-spin electron or a down-spin electron to flow; an electron spin acting part 9 for allowing a tunnel current to occur by the spin acting; an electron spin detecting part 5 for selectively detecting the up-spin electron or the down-spin electron; and a substrate 6 with the respective parts mounted thereon. The electron spin acting part 9 includes an interface 3 between an inorganic ultra-thin film 8 and an organic ultra-thin film 7. A spatial charge to be generated via the interface 3 is set to be not more than 10<SP>8</SP>C/m<SP>3</SP>. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007035944(A) 申请公布日期 2007.02.08
申请号 JP20050217405 申请日期 2005.07.27
申请人 RICOH CO LTD 发明人 KO HIROYOSHI
分类号 H01L43/10;G01R33/09;H01L29/82;H01L43/08 主分类号 H01L43/10
代理机构 代理人
主权项
地址
您可能感兴趣的专利