| 摘要 |
PROBLEM TO BE SOLVED: To surely remove bubbles in the chemical generating a fault such as a defective pattern in the chemicals processing apparatus used in the lithography process. SOLUTION: In the chemical processing apparatus; the chemical L in a chemical supplying tank 1 is sent with pressure to a particle filter 5 with a chemical pressure sending pump 4, and the chemical L having passed the particle filter 5 is supplied to a wafer W of a processor 2 with a chemical discharge pump 6. Moreover, a plurality of bubble removing apparatuses 3A, 3B are also allocated between the chemical tank 1 and the chemical pressure sending pump 4. The bubbles can be surely removed with a plurality of bubble removing apparatuses 3A, 3B. COPYRIGHT: (C)2007,JPO&INPIT
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