发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To keep an airtight chamber of a lifting table installed in a standby chamber in the airtight seal state. SOLUTION: Batch type heat treatment equipment 10 comprises a treatment chamber 19 for treating a group of wafers 1 held by a boat 13, the standby chamber 12 wherein the boat 13 stands by immediately below the treatment chamber 19, boat elevator 24 which is installed outside the standby chamber 12 to carry in and out the boat 13 from the treatment chamber 19, the lifting table 37 which is installed inside the standby chamber 12 and supports the boat 13, and up-and-down shaft 32 which is inserted into the standby chamber 12 to connect the lifting table 37 and the boat elevator 24. A tube 54 connected to a helium gas supply line 55 is inserted into the airtight chamber 37d of the lifting table 37 from the up-and-down shaft 32, and a helium gas detector 58 is installed in an exhaust pipe 57 for exhausting a gas out of the standby chamber 12. By detecting a helium gas circulating in the exhaust pipe when it is supplied to the airtight chamber of the lifting table by means of the helium gas detector, the airtight chamber of the lifting table is checked for leakage. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007035754(A) 申请公布日期 2007.02.08
申请号 JP20050214013 申请日期 2005.07.25
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 ISHII AKINORI
分类号 H01L21/22;C23C14/00;C23C14/56;C23C16/54;H01L21/205 主分类号 H01L21/22
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