发明名称 Rectangular filtered vapor plasma source and method of controlling vapor plasma flow
摘要 The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors ( 62, 64, 66, 68 ) disposed along the short sides ( 32 c, 32 d) of a rectangular target ( 32 ) behind the target, and a magnetic focusing system disposed along the long sides ( 32 a, 32 b) of the target ( 32 ) in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides ( 32 a, 32 b) of the target ( 32 ). The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor ( 62, 64, 66, 68 ) can be controlled independently. In a further embodiment, electrically independent steering conductors ( 62, 64, 66, 68 ) are disposed along opposite long sides ( 32 a, 32 b) of the cathode plate ( 32 ), and by selectively varying a current through one conductor, the path of the arc spot shifts to widen the erosion corridor. The invention also provides a plurality of internal anodes, and optionally a surrounding anode for deflecting the plasma flow.
申请公布号 US2007029188(A1) 申请公布日期 2007.02.08
申请号 US20060572120 申请日期 2006.03.16
申请人 GOROKHOVSKY VLADIMIR I 发明人 GOROKHOVSKY VLADIMIR I.
分类号 C23C14/32;B05C5/00;C23C14/00;C23C14/06;H01J37/32 主分类号 C23C14/32
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