| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device, capable of independently and simply adjusting the symmetry and the centroid position of effective light source distribution. <P>SOLUTION: The exposure device is equipped with an illumination optical system for illuminating a mask with the light from a light source, and a projection optical system for projecting a pattern image of the mask on a substrate. The illumination optical system comprises a first optical unit for forming a primary optical distribution from a light source side, a second optical unit for transforming the primary optical distribution to a secondary optical distribution, and a third optical unit for magnifying the secondary optical distribution to a desired size to form a tertiary optical distribution. The symmetry (uniformity) and the centroid position of the tertiary optical distribution are adjusted independently, by subjecting at least two of the first optical unit, the second optical unit, and the third optical unit to eccentric drive. <P>COPYRIGHT: (C)2007,JPO&INPIT |
