| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device capable of excellent cleaning. SOLUTION: The cleaning device is a substrate cleaning device 100 which cleans a substrate, and comprises a mist producing chamber 101 in which a spray 108 producing mist is arranged, a mist sticking chamber 102 which is provided separately from the mist producing chamber 101 and sticks mist on a surface of the substrate 107, and an ultrasonic cleaning chamber 103 which ultrasonic-cleans the substrate 107 with the sticking mist with cleaning fluid. An spray hole of the spray 108 is arranged facing a bottom wall in the mist producing chamber 101 and the cleaning fluid is sprayed from the atomization hole 111 to the bottom wall to be scattered, thereby producing the mist. COPYRIGHT: (C)2007,JPO&INPIT
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