| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize stable plasma discharge by suppressing density jump accompanying increase in microwave power while attaining a wide area and homogenization. <P>SOLUTION: This microwave plasma generating device comprises a microwave source generating excitation microwave, a plasma gas source, a vacuum vessel for plasma generation supplied with gas from the plasma gas source, a coaxial waveguide tube 3 for guiding the excitation microwave into the container, a first conductor 21 fixed to an outer conductor 33 of the coaxial waveguide tube, a quartz plate 23 connected with a coaxial waveguide tube central conductor 32 and attached to the first conductor 21, a second conductor 22 fixed to the quartz plate 23 and emitting the microwave in the vacuum vessel and a parallel flat plate launcher 20 forming a resonance cavity. <P>COPYRIGHT: (C)2007,JPO&INPIT |
