| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device in which, even when a photoelectric conversion device is disposed at an offset location in a pixel area, incident beams are certainly focused on the photoelectric conversion device to enhance its sensitivity. SOLUTION: A photosensitive transparent resin layer is laminated on a substrate having a surface laid out into a plurality of pixel areas, and arranged with the photoelectric conversion device in each of these pixel areas. After the photosensitive transparent resin layer is exposed and developed in a pattern shape, it is heated to form a convex microlens. Upon this formation, the pattern is formed such that it has a comparatively narrow width on the side of the photoelectric conversion device, and has a comparatively broad width on the opposite side. The surface is melted by heating to form the convex microlens in which a top P2 is at an offset location on the opposite side of the photoelectric conversion device. Also, its radius of curvature is great on the side of the photoelectric conversion device. COPYRIGHT: (C)2007,JPO&INPIT
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