RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A resist composition comprising organic solvent (S) and, dissolved therein, resin component (A) whose solubility in alkali is changed by the action of an acid and acid generator component (B) which when exposed to light, generates an acid, wherein the organic solvent (S) contains aromatic organic solvent (S1). There is provided a resist composition with LWR reduced, and provided a method of forming a resist pattern therewith.