| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a mask that can maintain predetermined process tolerance. <P>SOLUTION: The method for producing a mask to be used to project a predetermined design pattern on a mask onto an exposure object by exposure includes a calculation step of calculating the process tolerance when a first pattern and a second pattern disposed on the mask are transferred separately onto the object, a judge step of judging whether the process tolerance satisfies a reference value or not, a correction step of correcting the pattern by moving the position of at least either the first or the second pattern so as to satisfy the reference value when the process tolerance fails the reference value, and an insertion step of inserting a third pattern smaller than both of the first and second patterns into between the first and second patterns. <P>COPYRIGHT: (C)2007,JPO&INPIT |
