| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure method and device ensuring good definition performance. <P>SOLUTION: The exposure device for exposing the pattern of a reticle onto an exposed body by using light from a light source and a optical system comprises a section for measuring polarization information of the light passed through the optical system, and a section for controlling the exposure parameter of at least one of the light source and the optical system based on measurements from the measuring section wherein the polarization information includes at least one of polarization intensity in two directions parallel with the optical axis and intersecting perpendicularly to each other, polarization intensity ratio, polarization degree and phase difference. <P>COPYRIGHT: (C)2007,JPO&INPIT |
