| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate for a liquid crystal apparatus that do not require complex steps are not needed and with which manufacturing cost can be reduced. <P>SOLUTION: The manufacturing method of the substrate for the liquid crystal apparatus includes a film to be worked forming step for forming a film (104) to be worked on a substrate (100); a photosensitive film forming step for forming a photosensitive film (108) on the film to be worked; an exposure step for crossing two laser beams (B1, B2), having wavelengths sorter than a wavelength of a visible light to generate interference light; exposing the photosensitive film by irradiation with the interference light and forming a latent image (109) on the pattern of the interference light on the photosensitive film; a developing step for developing the photosensitive film to make a shape, corresponding to the pattern of the latent image, manifest on the photosensitive film and an etching step for performing etching by using the developed photosensitive film as an etching mask to work the surface of the film to be worked. <P>COPYRIGHT: (C)2007,JPO&INPIT |
