| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent dielectric breakdowns of a voltage-impressed electrode and a ground electrode by restraining a creeping discharge along the wall surface of an insulator. <P>SOLUTION: The plasma reactor is provided with: a pair of the high-voltage-impressed electrode 13 and the ground electrode 14 which are arranged to be opposed to each other; the insulator 15 for holding the high-voltage-impressed electrode 13 and the ground electrode 14 while leaving an opposed space between them; and an inorganic dielectric layer 17 which is arranged in a discharge space between the high-voltage-impressed electrode 13 and the ground electrode 14, through which the gas to be treated is made to pass and which is composed of a granular inorganic dielectric 17a. A creeping distance extending part 20 having a recessed part 20a on the inner wall surface 15a abutted on the inorganic dielectric layer 17 is formed on the insulator 15. The shortest distance from the high-voltage-impressed electrode 13 to the ground electrode 14 via the creeping distance extending part 20 is made longer than the shortest distance from the high-voltage-impressed electrode 13 to the ground electrode 14 via the inorganic dielectric layer 17. <P>COPYRIGHT: (C)2007,JPO&INPIT |
