发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem that it is difficult to optimally lay out two kinds of conductive FinFET at a high density. <P>SOLUTION: Gate electrodes 11 are disposed in parallel or vertical to a specified crystal orientation of a substrate 11. A first conductive first transistor PMOS has an active region disposed orthogonally to the gate electrode. A second conductive second transistor NMOS has an active region disposed obliquely to the gate electrode 11. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007035957(A) 申请公布日期 2007.02.08
申请号 JP20050217687 申请日期 2005.07.27
申请人 TOSHIBA CORP 发明人 YAGISHITA JUNJI
分类号 H01L21/8238;H01L21/28;H01L27/08;H01L27/092;H01L29/41;H01L29/423;H01L29/49;H01L29/786 主分类号 H01L21/8238
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