| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and method for achieving highly accurate exposure by high focusing accuracy. <P>SOLUTION: The exposure device for exposing a pattern of a reticle to a body to be exposed via a projection optical system while scanning the reticle and the body to be exposed comprises a measuring section, for measuring the position of the projection optical system on the surface of an object to be measured in the direction of an optical axis; and a control unit for controlling the position on the surface of the object in the direction of the optical axis, on the basis of a measurement result by the measuring section. The measuring section uses the average of a plurality of times of measurement results obtained at the same measurement point as a measurement value at the same measurement point. The foregoing object to be measured is the reticle or the body to be exposed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
