| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device for measuring thin film thickness for accurately measuring the thickness or thickness distribution of a thin film of several hundreds of nm or less with a simple constitution. SOLUTION: Light intensity is divided into a plurality of wavelength band components every reflection angle of light from the thin film and is acquired, and a reflection angle characteristic every wavelength band component is acquired from each wavelength band component of the acquired light intensity. Then, a correlation coefficient representing similarity between the acquired reflection angle characteristic and another previously acquired reflection angle characteristic every wavelength band component is determined, and the thickness of the thin film is determined based on the maximum of product of correlation coefficient every wavelength band component. COPYRIGHT: (C)2007,JPO&INPIT
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