发明名称 |
Lithographic apparatus and device manufacturing method using dose control |
摘要 |
A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.
|
申请公布号 |
US2007030471(A1) |
申请公布日期 |
2007.02.08 |
申请号 |
US20060580134 |
申请日期 |
2006.10.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
TROOST KARS Z.;BLEEKER ARNO J. |
分类号 |
G02B26/08;G03B27/54;G03F7/20;H01L21/027 |
主分类号 |
G02B26/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|