| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a conveyance apparatus which can prevent the generation of difference in line width of an exposure pattern or the like due to different exposure elapsed time. <P>SOLUTION: The conveyance apparatus 2 to convey an exposed substrate P includes moving means 8a, 22 and 24 for moving the substrate P while the substrate P is being placed thereon, and a temperature control means for controlling the temperature of the exposed substrate P. The temperature control means controls temperature for each of areas of the substrate P according to the exposure elapsed time. <P>COPYRIGHT: (C)2007,JPO&INPIT |
