| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkaline-developable photosensitive resin composition that is superior in sensitivity, resolution, transparency, adhesion and alkali resistance and is capable of accurately forming fine patterns. <P>SOLUTION: The alkaline-developable photosensitive resin composition contains a reaction product, obtained by sequentially esterifying a polybasic acid anhydride (C) and a polyfunctional epoxy compound (D) with an epoxy adduct, having a structure formed by adding an unsaturated monobasic acid (B) to an epoxy resin (A), wherein the epoxy adduct has the structure formed by adding 0.1-1.0 piece of carboxyl group of the unsaturated monobasic acid (B) to 1 epoxy group of the epoxy resin (A), and esterification is performed in a ratio of 0.1-1.0 acid anhydride structure of the polybasic acid anhydride (C) and in a ratio of 0.1-1.0 epoxy group of the polyfunctional epoxy compound (D) to 1 hydroxyl group of the epoxy adduct. <P>COPYRIGHT: (C)2007,JPO&INPIT |
