ION IMPLANTATION MASK AND METHOD FOR MANUFACTURING SAME, SILICON CARBIDE SEMICONDUCTOR DEVICE USING ION IMPLANTATION MASK, AND METHOD FOR MANUFACTURING SAME,申请号KR20060072059-传众专利搜索

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发明名称	ION IMPLANTATION MASK AND METHOD FOR MANUFACTURING SAME, SILICON CARBIDE SEMICONDUCTOR DEVICE USING ION IMPLANTATION MASK, AND METHOD FOR MANUFACTURING SAME
摘要
申请公布号	KR20070016069(A)	申请公布日期	2007.02.07
申请号	KR20060072059	申请日期	2006.07.31
申请人		发明人
分类号	H01L21/266	主分类号	H01L21/266
代理机构		代理人
主权项
地址

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