| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer compound having excellent reactivity, stiffness and adhesivity with a substrate and less swelling at the development, a resist material using the polymer compound as the base resin, and having largely improved resolution and etching resistance, a pattern formation method using the resist material and a new tetrahydrofuran compound with its production method useful as the raw material monomer for the polymer compound. SOLUTION: The polymer compound containing a repeating unit shown in the general formula (1-1) or (1-2) whose weight-average molecular weight is 1,000 to 500,000 is provided. (R<1> , R<2> , R<3> and R<4> each represents H or an alkyl group. R<1> and R<2> , and R<3> and R<4> each may form a ring by coupling each other, where in that case an alkylene group is formed by the combination of R<1> /R<2> and R<3> /R<4> ; k is 0 or 1). Accordingly, the resist material containing the polymer compound as a base resin responses to a high energy ray and is superior in a sensitivity, resolving power and etching resistance. |
