发明名称 Gallium nitride device substrate comprising a gallium nitride based buffer layer and method of manufacturing the same
摘要 <p>A gallium nitride device substrate (100) comprises a layer (110) of gallium nitride containing an additional lattice parameter altering element located over a substitute substrate (114).</p>
申请公布号 EP1750311(A2) 申请公布日期 2007.02.07
申请号 EP20060015818 申请日期 2006.07.28
申请人 AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD. 发明人 LESTER, STEVEN D.;ROBBINS, VIRGINIA M.;CORZINE, SCOTT W.
分类号 C30B25/18;C30B29/40;H01L21/20;H01L33/00 主分类号 C30B25/18
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