发明名称 |
Method and system for a pellicle frame with heightened bonding surfaces |
摘要 |
A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
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申请公布号 |
US7173689(B2) |
申请公布日期 |
2007.02.06 |
申请号 |
US20040986077 |
申请日期 |
2004.11.12 |
申请人 |
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发明人 |
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分类号 |
G03B27/32;G03B27/58;G03B27/62;G03F7/20 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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