发明名称 Semiconductor structure with improved on resistance and breakdown voltage performance
摘要 A lateral FET cell is formed in a body of semiconductor material. The lateral FET cell includes a super junction structure formed in a drift region between a drain contact and a body region. The super junction structure includes a plurality of spaced apart filled trenches bounding in part a multiplicity of striped doped regions having opposite or alternating conductivity types.
申请公布号 KR20070015889(A) 申请公布日期 2007.02.06
申请号 KR20060072565 申请日期 2006.08.01
申请人 发明人
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址