发明名称 PHOTOCATALYST COMPLEX AND COMPOSITION COMPRISING SAME FOR PRODUCTING HYDROGEN THROUGH WATER SPLITTING
摘要 A photocatalyst complex for producing hydrogen through water splitting which can stably immobilize a photo-sensitizer onto a surface of a photocatalyst, and has excellent hydrogen generating efficiency irrespective of ion trend of the photo-sensitizer, a preparation method of the photocatalyst complex, a composition comprising the photocatalyst complex for producing hydrogen through water splitting, and a method for producing hydrogen through water splitting using the composition are provided. A photocatalyst complex comprises: photocatalyst particles(10); cocatalyst particles(20) coated on the photocatalyst particles; and a hydrogen ion conductive polymer film(40) for surrounding the photocatalyst particles coated with the cocatalyst particles, wherein the cocatalyst is selected from the group consisting of Pt, Au, Ag, Pd, RuOx and a mixture thereof, and the hydrogen ion conductive polymer film comprises a polymer resin having a cation exchanger selected from the group consisting of a sulfonic acid group, a carboxylic acid group, a phosphoric acid group, a phosphonic acid group and derivatives thereof on a side chain thereof. A composition for producing hydrogen through water splitting comprises: the photocatalyst complex; and a photo-sensitizer(30) for converting a solar light into electrochemical energy, wherein the photo-sensitizer is a cation photo-sensitizer selected from the group consisting of M-bipyridyl(where M is a transition metal), porphyrin, N-porphyrin(where N is selected from the group consisting of Zn, Sn and transition metal), and mixtures thereof, or an anion photo-sensitizer selected from the group consisting of M-bipyridyl(where M is a transition metal) including a functional group selected from the group consisting of a carboxyl group and a phosphonic acid group, porphyrin, N-porphyrin(where N is selected from the group consisting of Zn, Sn and transition metal), and mixtures thereof.
申请公布号 KR100682033(B1) 申请公布日期 2007.02.06
申请号 KR20050135198 申请日期 2005.12.30
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION;POSTECH FOUNDATION 发明人 CHOI, WON YONG;PARK, HYUN WOONG
分类号 B01J21/06;B01J23/06;B01J23/38 主分类号 B01J21/06
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