发明名称 |
Method of measuring pattern dimension and method of controlling semiconductor device process |
摘要 |
This invention provides a method of measuring semiconductor pattern dimensions capable of realizing a stable and highly precise pattern dimension measurement technique even when the pattern cross-sectional shapes are changed and making the calculation amount relatively small to reduce the calculation time. More specifically, the relationship between cross-sectional shapes of a pattern and measurement errors in a specified image processing technique is evaluated in advance by the electron beam simulation in a pattern measurement system in a length measuring SEM, and in the actual dimension measurement, dimensions of an evaluation objective pattern are measured from image signals of a scanning electron microscope, and errors of the dimensional measurement of the evaluation objective pattern are estimated and revised based on the relationship between cross-sectional shapes of a pattern and measurement errors evaluated in advance, thereby realizing highly precise measurement where dimensional errors depending on pattern solid shapes are eliminated.
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申请公布号 |
US7173268(B2) |
申请公布日期 |
2007.02.06 |
申请号 |
US20040986910 |
申请日期 |
2004.11.15 |
申请人 |
HITACHI HIGH-THECNOLOGIES CORPORATION |
发明人 |
TANAKA MAKI;MOROKUMA HIDETOSHI;SHISHIDO CHIE;TAKAGI YUJI |
分类号 |
G01B15/00;G01N21/86;G01B11/14;G01N23/225;H01L21/66 |
主分类号 |
G01B15/00 |
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