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发明名称
Manufacturing method for semiconductor device having low contact resistance
摘要
申请公布号
KR100678314(B1)
申请公布日期
2007.02.02
申请号
KR20040106055
申请日期
2004.12.15
申请人
发明人
分类号
H01L27/092
主分类号
H01L27/092
代理机构
代理人
主权项
地址
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