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发明名称
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE WITH DEEP CONTACT HOLE
摘要
申请公布号
KR100677772(B1)
申请公布日期
2007.02.02
申请号
KR20050058893
申请日期
2005.06.30
申请人
发明人
分类号
H01L21/8242
主分类号
H01L21/8242
代理机构
代理人
主权项
地址
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