Method for in-situ cleaning semiconductor substrate and method of fabricating semiconductor device employing the same,申请号KR20050003892-传众专利搜索

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发明名称	Method for in-situ cleaning semiconductor substrate and method of fabricating semiconductor device employing the same
摘要
申请公布号	KR100678468(B1)	申请公布日期	2007.02.02
申请号	KR20050003892	申请日期	2005.01.14
申请人		发明人
分类号	H01L21/304;H01L21/336	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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