| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for treating an exhaust gas capable of simply supplying oxygen and hydrogen essential for a plasma decomposition reaction, and stably proceeding the plasma decomposition reaction to efficiently decompose and remove PFC (perfluorocompound). <P>SOLUTION: The apparatus for treating an exhaust gas comprises: introducing an exhaust gas containing PFC to a pretreatment scrubber 1, in which water is added to the exhaust gas by spraying water from a water spray nozzle 4; and subjecting the exhaust gas to a plasma decomposition reaction in a reaction chamber 9 in a plasma treatment unit 7, wherein for adjusting an amount of water added to a necessary amount for the plasma decomposition reaction, the temperature of water sprayed is controlled so that a sufficient amount of water can be added thereto, and cooling water from a water cooling jacket 92 is preferably used for water for spraying. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
