发明名称 FLAT DISPLAY AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a flat display for less degradation in characteristics of an organic thin film transistor. SOLUTION: The manufacturing method of a flat display includes a step for providing an insulating substrate; a step to form a source electrode and a drain electrode that are provided apart to define a channel region on the insulating substrate; a step for forming a first protective layer on the source electrode and the drain electrode; a step for forming a metal layer in which an opening corresponding to the channel region is provided on the first protective layer; a step for forming a placement hole for exposing the channel region on the first protective layer through the opening with the metal layer as a mask, a step for forming an organic semiconductor layer and a second protective layer sequentially inside the placement hole and on the metal layer; and a step for removing the second protective layer and the organic semiconductor layer other than the placement hole and the metal layer. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027733(A) 申请公布日期 2007.02.01
申请号 JP20060191301 申请日期 2006.07.12
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 CHOI TAE-YOUNG;KIM JUN-HYEONG;SO KONKEI;KO MUNSHAKU
分类号 H01L29/786;H01L21/336;H01L51/05;H01L51/40 主分类号 H01L29/786
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