摘要 |
In a method of forming an as-grown active p-type III-V nitride compound layer, a substrate is introduced and heated in a reaction chamber. N<SUB>2 </SUB>carrier gas and reactive compounds including a source compound of a group III element, a nitrogen source compound, and a p-type impurity are fed in the reaction chamber. A chemical reaction occurs to form an as-grown active p-type III-V nitride compound layer.
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