发明名称 SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing device and a method of manufacturing a semiconductor device for inhibiting formation of a reaction by-product around a rotary shaft to suppress particle generation and to prevent a failure in rotary drive. SOLUTION: A reaction tube 11 is constituted of an internal reaction tube 111 and an external reaction tube 112 which are mounted on a manifold 12, respectively. A furnace lid 18 has a through-hole 182 for the rotary shaft 16. The furnace lid 18 is structured to open/close a passage of a boat 14 from the outside into the reaction tube 11 (internal reaction tube 111) with the periphery of the rotary shaft 16 in the vicinity of the through-hole 182 protected by an inert gas atmosphere. The furnace lid 18 has a recess 183 for cylindrically surrounding the periphery of the rotary shaft 16 in the vicinity of the through-hole 182, and has a gas inlet tube 184 for supplying an inert gas to an isolation region 19 between the recess 183 and the shaft 16. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027599(A) 申请公布日期 2007.02.01
申请号 JP20050210860 申请日期 2005.07.21
申请人 SEIKO EPSON CORP 发明人 TAKIZAWA SEIJI
分类号 H01L21/205 主分类号 H01L21/205
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