发明名称 METHOD OF FABRICATING VERTICAL STRUCTURE COMPOUND SEMICONDUCTOR DEVICES
摘要 A method of fabricating a vertical structure opto-electronic device includes fabricating a plurality of vertical structure opto-electronic devices on a crystal substrate, and then removing the substrate using a laser lift-off process. The method then fabricates a metal support structure in place of the substrate. In one aspect, the step of fabricating a metal support structure in place of the substrate includes the step of plating the metal support structure using at least one of electroplating and electro-less plating. In one aspect, the vertical structure is a GaN-based vertical structure, the crystal substrate includes sapphire and the metal support structure includes copper. Advantages of the invention include fabricating vertical structure LEDs suitable for mass production with high reliability and high yield.
申请公布号 WO2004109764(A3) 申请公布日期 2007.02.01
申请号 WO2004US17297 申请日期 2004.06.03
申请人 YOO, MYUNG CHEOL 发明人 YOO, MYUNG CHEOL
分类号 H01L21/00;H01L27/15;H01L29/26;H01L31/12;H01L33/00;H01L33/32;H01S5/02;H01S5/042;H01S5/183;H01S5/323 主分类号 H01L21/00
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