| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material having excellent exposure sensitivity, providing a preferable resist surface state, and forming a pattern of higher definition for the purpose of forming a permanent pattern such as a solder resist, and also to provide a pattern forming apparatus equipped with the pattern forming material, and a method for forming a permanent pattern using the above pattern forming material. <P>SOLUTION: The pattern forming material is characterized in that: the material has at least a photosensitive layer obtained by using a photosensitive composition comprising at least a binder, a polymerizable compound, a photopolymerization initiator, a thermal crosslinking agent, and a dye having a basic nucleus as a sensitizer; and the minimum energy of light used for exposure not causing changes in the thickness in an exposed part of the photosensitive layer by exposure and development, is 0.1 to 100 mJ/cm<SP>2</SP>in a process of exposing and developing the photosensitive layer. The pattern forming apparatus is equipped with the above pattern forming material, and the method for forming a permanent patter is carried out by using the above pattern forming material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
