发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To realize easy attachment position adjustment of a fine tube such as a gas supply tube in a processing furnace of a substrate processing device. SOLUTION: The device has reaction tubes 45, 46 forming a processing chamber for processing a substrate, a manifold 44 wherein the reaction tube is raised and provided, a port 40 provided to the manifold, a fine tube 47 inserted to the port inside the processing chamber, a projection formed in the fine tube, and a fitting means which is provided to the manifold for confining displacement of the processing chamber in the radial direction. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027426(A) 申请公布日期 2007.02.01
申请号 JP20050207632 申请日期 2005.07.15
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 MORITA SHINYA
分类号 H01L21/205;H01L21/22 主分类号 H01L21/205
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