发明名称 COLORED PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>A colored photosensitive resin composition for forming pattern of a color filter is provided to produce the color filter with improved pattern adhesiveness and high transmission while reducing development residue of non-pixel part of the color filter. The resin composition includes: (A) a coloring agent; (B) binder resin; (C) photo-polymeric compound; (D) photo-polymerization initiator; (E) solvent; and (F) at least one selected from a compound represented by a formula(1a) and another compound represented by a formula(1b), wherein R^1 and R^2 are independently hydrogen or alkyl group having 1 to 4 carbon atoms, p is integer ranging from 4 to 90, q, r and s are independently integer ranging from 1 to 40. Content of the compound(F) is less than 5.0wt.% relative to total solid content of the composition. The compound(F) has weight average molecular weight of 300 to 5,000 in terms of polystyrene. The composition is used to form pattern of a color filter.</p>
申请公布号 KR20070014999(A) 申请公布日期 2007.02.01
申请号 KR20060070330 申请日期 2006.07.26
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 ICHIKAWA KOJI;AKIYAMA YUJI
分类号 G03F7/004;G02B5/20;G03F1/00;H01L27/14 主分类号 G03F7/004
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