发明名称 |
BIPOLAR TRANSISTOR AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To increase a breakdown voltage between a base and a collector without increasing the harmonic distortion in a manufacturing method for a bipolar transistor. SOLUTION: The manufacturing method for a bipolar transistor has an SIC layer in a collector region at the lower part of an emitter region. The method includes a step for forming an SIC layer in which impurity concentration at four corners is lower than that of at the central part. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007027616(A) |
申请公布日期 |
2007.02.01 |
申请号 |
JP20050211098 |
申请日期 |
2005.07.21 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
MIURA TAKASHI |
分类号 |
H01L21/331;H01L21/28;H01L29/417;H01L29/732;H01L29/737 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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