发明名称 BIPOLAR TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To increase a breakdown voltage between a base and a collector without increasing the harmonic distortion in a manufacturing method for a bipolar transistor. SOLUTION: The manufacturing method for a bipolar transistor has an SIC layer in a collector region at the lower part of an emitter region. The method includes a step for forming an SIC layer in which impurity concentration at four corners is lower than that of at the central part. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027616(A) 申请公布日期 2007.02.01
申请号 JP20050211098 申请日期 2005.07.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MIURA TAKASHI
分类号 H01L21/331;H01L21/28;H01L29/417;H01L29/732;H01L29/737 主分类号 H01L21/331
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