发明名称 Gas treatment device and heat readiting method
摘要 A shower head formed by stacking a shower base, a gas diffusion plate, and a shower plate and supplying material gas and oxidizer gas to a wafer on a loading table through a first gas diffusion part and a second gas diffusion part formed in both faces of the gas diffusion plate, first gas outlets formed in the shower plate and communicating with a first gas diffusion space, and second gas outlets formed in the shower plate and communicating with a second gas diffusion space. A plurality of heat transfer columns fitted closely to the lower surface of the shower base are installed in the first gas diffusion part so that portions therebetween can form the first gas diffusion space, and radiant heat from the loading table is transmitted by the heat transfer columns in the thickness direction of the shower head.
申请公布号 US2007022954(A1) 申请公布日期 2007.02.01
申请号 US20060570603 申请日期 2006.03.03
申请人 TOKYO ELECTRON LIMITED 发明人 IIZUKA HACHISHIRO;KIMURA KOICHIRO;IKEDA KYOKO;SAKODA TOMOYUKI;YASUMURO AKIRA
分类号 C23F1/00;C23C16/00;C23C16/44;C23C16/455 主分类号 C23F1/00
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